Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8045224 | Vacuum | 2014 | 7 Pages |
Abstract
A new approach toward the generation of wide-format directed fluxes of low-temperature plasma outside the interelectrode space and a corresponding gas discharge device to be used for the formation of micro- and nano-sized diffraction patterns on wide-format wafers have been proposed based on the analysis results of gas discharge devices that generate the ion-electron beams under high-voltage gas discharge.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
N.L. Kazanskiy, V.A. Kolpakov, V.V. Podlipnov,