Article ID Journal Published Year Pages File Type
8045224 Vacuum 2014 7 Pages PDF
Abstract
A new approach toward the generation of wide-format directed fluxes of low-temperature plasma outside the interelectrode space and a corresponding gas discharge device to be used for the formation of micro- and nano-sized diffraction patterns on wide-format wafers have been proposed based on the analysis results of gas discharge devices that generate the ion-electron beams under high-voltage gas discharge.
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Authors
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