Article ID Journal Published Year Pages File Type
8045374 Vacuum 2013 6 Pages PDF
Abstract
► We simulate all sputtering processes. ► First we simulate plasma formation, next target erosion, and lastly film deposition. ► We apply the method to magnetron sputtering apparatuses. ► One is a large cylindrical apparatus with diameter 1200 mm. ► Another is a three-dimensional apparatus.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Preview
Synthetic simulation of plasma formation, target erosion, and film deposition in a large magnetron sputtering apparatus
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