| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8045398 | Vacuum | 2013 | 5 Pages |
Abstract
âºWe produced a 915 MHz ECR plasma for different magnetic field distributions. ⺠The ECR plasma was uniform for diverging and magnetic mirror field. ⺠The uniformity of ECR plasma was realized for a critical microwave power. ⺠Low electron temperature plasma was realized for diverging magnetic field.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Tobias Röwf,