| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8045410 | Vacuum | 2013 | 4 Pages |
Abstract
⺠We propose local micro sputter etching by DC Ar plasma in SEM chamber. ⺠An orifice gas nozzle as an anode was used for DC plasma generation. ⺠Gap distance and gas flow rate play an important role in V-I characteristics. ⺠From the V-I characteristics, the proper condition for micro sputtering was achieved.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Khanit Matra, Yusuke Mizobuchi, Hiroshi Furuta, Akimitsu Hatta,