Crystallization of ITO and TiO2 by RF plasma treatment

► Amorphous films were crystallized within few minutes without heating using RF plasma. ► The key parameter of the plasma crystallization process is the plasma gas pressure. ► The parameter depends on the plasma gas species and applied RF power. ► Easiness of plasma crystallization depends on the film preparation conditions. ► The plasma excitation in crystallization should be different from heat excitation.