| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8045496 | Vacuum | 2013 | 4 Pages |
Abstract
⺠Fluorocarbon films were formed by sputtering at temperatures from â5 to 200 °C. The amount of cross-linking increased with increasing substrate temperature. ⺠Correspondingly, the adhesion strength of the films to the Si substrate improved.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Yuta Suzuki, Haojie Fu, Yoshio Abe, Midori Kawamura,