Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
81131 | Solar Energy Materials and Solar Cells | 2007 | 4 Pages |
Abstract
A set of In2Se3 films was grown on (1 1 1) Si substrate with AlN buffer by metalorganic chemical vapor deposition (MOCVD) using H2Se as the metalogramic precursors for Se. The In2Se3 films on (1 1 1) Si substrate were pinhole-free with homogeneous and lamellar structures. It was found that by properly controlling the substrate temperatures, single-phase γ-In2Se3 films with fairly good optical properties can be well fabricated. Photoluminescence spectra of single-phase γ-In2Se3 show exciton emissions at 2.140 eV at 10 K. The band gap of single-phase γ-In2Se3 at room temperature is estimated at 1.943 eV.
Keywords
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Catalysis
Authors
D.Y. Lyu, T.Y. Lin, J.H. Lin, S.C. Tseng, J.S. Hwang, H.P. Chiang, C.C. Chiang, S.M. Lan,