| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 81348 | Solar Energy Materials and Solar Cells | 2006 | 9 Pages |
Abstract
Irradiation of polycrystalline sputter-deposited ITO thin films on float-glass substrates was performed with high-energy MeV He+ ion beam implantation at doses in the range 2–6×10+15 ions/cm2. A significant change in both surface morphology and crystallographic structure after implantation was observed. It results in a crystallographic disorder of large crystallites with the ion dose, creation of electronic defects and a roughening of the ITO thin-films’ surface.
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Authors
M. Maaza, O. Nemraoui, A.C. Beye, C. Sella, T. Derry,