Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8145785 | Infrared Physics & Technology | 2018 | 18 Pages |
Abstract
In this work, we study and report the dry etching processes for InAs-based InAs/GaAsSb strain-free superlattice long wavelength infrared (LWIR) detectors. The proper etching parameters were first obtained through the parametric studies of Inductively Coupled Plasma (ICP) etching of both InAs and GaSb bulk materials in Cl2/N2 plasmas. Then an InAs-based InAs/GaAsSb superlattice LWIR detector with PÏN structure was fabricated by using the optimized etching parameters. At 80â¯K, the detector exhibits a 100% cut-off wavelength of 12â¯Î¼m and a responsivity of 1.5â¯A/W. Moreover, the dark current density of the device under a bias of â200â¯mV reaches 5.5â¯Ãâ¯10â4â¯A/cm2, and the R0A is 15â¯Î©â¯cm2. Our results pave the way towards InAs-based superlattice LWIR detectors with better performances.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Atomic and Molecular Physics, and Optics
Authors
Min Huang, Jianxin Chen, Jiajia Xu, Fangfang Wang, Zhicheng Xu, Li He,