Si impurity concentration in nominally undoped Al0.7Ga0.3N grown in a planetary MOVPE reactor

The unintentional silicon incorporation during the metalorganic vapor phase epitaxy (MOVPE) of nominally undoped Al0.7Ga0.3N in a Planetary Reactor under various growth conditions was investigated. Dependent on growth temperature, pressure and V/III ratio, Si concentrations of below 1 × 1016 up to 4 × 1017 cm−3 were measured. Potential Si sources are discussed and, by comparing samples grown in a SiC coated reactor setup and in a TaC coated setup, the SiC coatings in the reactor are identified as the most likely source for the unintentional Si doping at elevated temperatures above 1080 °C. Under identical growth conditions the background Si concentration can be reduced by up to an order of magnitude when using TaC coatings.