| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8150368 | Journal of Crystal Growth | 2015 | 5 Pages |
Abstract
In this article, the effect of different thermal annealing process on the concentration of inclusions down to 1 μm size is studied. A two-step process in tellurium vapors has been shown to be effective to anneal large tellurium inclusions and to preserve the high resistivity of the samples as well.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
G. Piacentini, N. Zambelli, G. Benassi, D. Calestani, M. Pavesi, A. Zappettini,