Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8155362 | Journal of Magnetism and Magnetic Materials | 2016 | 8 Pages |
Abstract
We have fabricated the uniform CoO-coated Co nanocluster-assembled films at various oxygen gas flow rates (fO) by using a plasma-gas-condensation method and studied their anomalous Hall effect (AHE). The longitudinal resistivity (Ïxx) of all the films exhibits a minimum at a temperature of Tmin. With the increase of fO, Tmin shifts from 150 to 300 K and has no longer change when fO is up to 0.10 sccm. The saturated AHE resistivity (ÏxyA) presents a near linear increase as fO rises. The anomalous Hall coefficient (Rs) at fO=0.20 sccm is 4.9Ã10â9 Ω cm Gâ1 at 300 K, which is almost three orders of magnitude larger than bulk Co. Moreover, at fO=0 and 0.05 sccm, the scaling exponents γ=1.2 and 1.24 in ÏxyAâÏxxγ are obtained in the region of 325-375 K; At fO=0.10, 0.15 and 0.20 sccm, ÏxyA decreases with the increase of Ïxx on a double-logarithmic scale, following a new scaling relation of log(ÏxyA/Ïxx)=a0+b0logÏxx in two temperature ranges of 5-300 K and 325-375 K.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
J.B. Wang, W.B. Mi, L.S. Wang, D.Q. Zeng, Y.Z. Chen, D.L. Peng,