Numerical study for beam loss occurring for wide-ranging transverse injection painting and its mitigation scenario in the J-PARC 3-GeV RCS

In the J-PARC 3-GeV Rapid Cycling Synchrotron (RCS), transverse injection painting is utilized to manipulate the transverse beam profile according to the requirements from the downstream facilities as well as to mitigate the space-charge induced beam loss in RCS. Therefore, a flexible control is required for the transverse painting area. But now the available range of transverse painting is limited to small area due to beta function beating caused by the edge focus of injection bump magnets which operate during the beam injection period. This beta function beating additionally excites various random betatron resonances through a distortion of the lattice super-periodicity, causing a shrinkage of the dynamic aperture during the injection period. This decrease of the dynamic aperture leads to extra beam loss at present when applying large transverse painting. For beta function beating caused by the edge focus, we proposed a correction scheme with additional pulse-type quadrupole correctors. In this paper, we will discuss the feasibility and effectiveness of this correction scheme for expanding the transverse injection painting area with no extra beam loss, while considering the beam loss and its mitigation mechanisms, based on numerical simulations.