Multilayer optics for monochromatic high-resolution X-ray imaging diagnostic in a broad photon energy range from 2Â keV to 22Â keV

The “Commissariat à l'énergie atomique et aux énergies alternatives” (CEA) studies and designs advanced X-ray diagnostics to probe dense plasmas produced at the future Laser MegaJoule (LMJ) facility. Mainly for X-ray imaging with high spatial resolution, different types of multilayer mirrors were developed to provide broadband X-ray reflectance at grazing incidence. These coatings are deposited on two toroidal mirror substrates that are then mounted into a Wolter-type geometry (working at a grazing angle of 0.45°) to realize an X-ray microscope. Non-periodic (depth graded) W/Si multilayer can be used in the broad photon energy range from 2 keV to 22 keV. A third flat mirror can be added for the spectral selection of the microscope. This mirror is coated with a Mo/Si multilayer for which the d-spacing varies in the longitudinal direction to satisfy the Bragg condition within the angular acceptance of the microscope and also to compensate the angular dispersion due to the field of the microscope. We present a study of such a so-called Göbel mirror which was optimized for photon energy of 10.35 keV. The three mirrors were coated using magnetron sputtering technology by Xenocs SA. The reflectance in the entire photon energy range was determined in the laboratory of the Physikalisch-Technische Bundesanstalt (PTB) at the synchrotron radiation facility BESSY II in Berlin.