Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
819184 | Composites Part B: Engineering | 2011 | 6 Pages |
Abstract
An Atomic force microscopy (AFM) based lithography system is successfully designed and constructed for automated patterning through local anodic oxidation. We present the detailed design of this system, where a novel technique is introduced by utilizing a motorized high precision XY stages to provide precise pattern movements while the AFM tip remains stationery. Several in-house hardware such as source measure unit and microscope imaging camera are integrated and controlled by a software tool. Numerous oxide structures are successfully created to demonstrate the ability of this low cost and accurate system, including a 30 μm long cantilever.
Related Topics
Physical Sciences and Engineering
Engineering
Engineering (General)
Authors
Y.J. Gan, H.Y. Wong, W.P. Lee,