Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8208052 | Results in Physics | 2018 | 5 Pages |
Abstract
An optical waveguide was fabricated by H+ ion implantation with an energy of 400â¯keV and a dose of 8â¯Ãâ¯1016â¯ions/cm2 in the oxyfluoride glass for the first time to the best of our knowledge. The dark mode spectra of the waveguide were measured by a prism coupling method before and after the thermal treatment. The number of modes was reduced after annealing. The implantation process of 400â¯keV H+ ions into the oxyfluoride glass was simulated by using the SRIM 2013 program. The refractive index distribution of the ion-implanted waveguide was reconstructed by the reflection calculation method. The refractive index was decreased in the waveguide region and there was an optical barrier with a reduced refractive index at the end of the ion range. The proton-implanted oxyfluoride glass waveguide is a desirable alternative for the fabrication of a compact optical integrated device.
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Authors
Yue Wang, Yuan Shen, Rin-Lin Zheng, Jian-Ping Shen, Hai-Tao Guo, Chun-Xiao Liu,