Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8209641 | Applied Radiation and Isotopes | 2015 | 5 Pages |
Abstract
In the present study the robustness of the etching process used by our laboratory was assessed. The strategy followed was based on the procedure suggested by Youden. Critical factors for the process were estimated using both Lenth's method and Dong's algorithm. The robustness test evidences that particular attention needs to be paid to the control of the etching solution's temperature.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
F. Leonardi, M. Veschetti, S. Tonnarini, F. Cardellini, R. Trevisi,