Article ID Journal Published Year Pages File Type
8209641 Applied Radiation and Isotopes 2015 5 Pages PDF
Abstract
In the present study the robustness of the etching process used by our laboratory was assessed. The strategy followed was based on the procedure suggested by Youden. Critical factors for the process were estimated using both Lenth's method and Dong's algorithm. The robustness test evidences that particular attention needs to be paid to the control of the etching solution's temperature.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Radiation
Authors
, , , , ,