| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8209925 | Applied Radiation and Isotopes | 2015 | 8 Pages |
Abstract
A comparative study between the quality of the layers produced on the Ti-coated Si wafers and the quality of layers grown on normal Ti foils was carried out by applying scanning electron microscopy and energy dispersive X-ray spectroscopy. Ti-coated Si wafers resulted clearly superior to Ti foils in the production of homogeneous 242Pu layers with minimum defectivity.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
A. Vascon, J. Runke, N. Trautmann, B. Cremer, K. Eberhardt, Ch.E. Düllmann,