Optimizing GaN photocathode structure for higher quantum efficiency

To improve the quantum efficiency of GaN photocathode, we optimized the photocathode's structure in three aspects. We use AlN replacing GaN as the buffer layer, which can act as potential barrier to reflect electrons back to surface. The optimal thickness of emission layer is calculated as 162.5 nm, and considering the graded doping profile, we optimized the thickness as 180 nm. Three built-in electric fields are introduced by Mg graded dope, and the intensities of the high fields are calculated to give the quantitive results of their influence. After surface cleaning and activation, quantum efficiency of the optimized sample was increased and the highest value of 56% was achieved at 240 nm. More quantum efficiency enhancement is possible by further optimizing the photocathode structure.