| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 849710 | Optik - International Journal for Light and Electron Optics | 2013 | 5 Pages |
Abstract
Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method.
Related Topics
Physical Sciences and Engineering
Engineering
Engineering (General)
Authors
Lanlan Li, Song Hu, Lixin Zhao, Ping Ma, Jinlong Li, Lingna Zhong,