| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 850663 | Optik - International Journal for Light and Electron Optics | 2013 | 4 Pages |
Abstract
The phenomenon of polarization has now become important in the field of optical imagery. It is well-known that the imaging properties of optical systems are determined by the diffraction properties of their apertures. This calls for a systematic study of diffraction properties of different apertures in presence of zonal masking devices. In the present paper, we study the diffraction properties of a circular aperture where the zonal polarization masks are mutually orthogonal. The variation of the PSF and OTF of such a system with the orientation of the analyzer placed at the output side have been studied.
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Authors
Mohammad Tahir, K. Bhattacharya, Ajay Ghosh, A.K. Chakraborty,