| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 851691 | Optik - International Journal for Light and Electron Optics | 2006 | 5 Pages |
Abstract
A novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. The effect of defocus on coma-induced pattern displacement is analyzed. The measuring principle of the method is described in detail. Using the simulation program PROLITH, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. It is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method.
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Authors
Mingying Ma, Xiangzhao Wang, Fan Wang,