| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 852098 | Optik - International Journal for Light and Electron Optics | 2010 | 4 Pages |
Abstract
The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography.
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Engineering (General)
Authors
Wenbo Jiang, Song Hu, Lixin Zhao, Wei Yan, Yong Yang,