DL capacitance–emission spectroscopy of determining the electrochemical behavior of anodized aluminum in aqueous solutions

In the present investigation, holographic interferometry was utilized for the first time to determine the rate change of the double layer (DL) capacitance of aluminum samples during the initial stage of anodization processes in aqueous solution without any physical contact. In fact, because the DL capacitance values in this investigation were obtained by holographic interferometry, electromagnetic method rather than electronic method, the abrupt rate change of the DL capacitance was called DL capacitance–emission spectroscopy. The anodization process (oxidation) of the aluminum samples was carried out chemically in different sulfuric acid concentrations (0.5–3.125% H2SO4) at room temperature. In the mean time, the real-time holographic interferometry was used to determine the difference of the DL capacitance of two subsequent values, dC, as a function of the elapsed time of the experiment for the aluminum samples in 0.5%, 1.0%, 1.5%, and 3.125% H2SO4 solutions. The DL capacitance–emission spectra of the present investigation represent a detailed picture of not only the rate change of the DL capacitance throughout the anodization processes, but also, the spectra represent the rate change of the growth of the oxide films on the aluminum samples in different solutions. Consequently, holographic interferometry is found very useful for surface-finish industries especially for monitoring the early stage of anodization processes of metals, in which the rate change of DL capacitance of the aluminum samples can be determined in situ.