Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
852482 | Optik - International Journal for Light and Electron Optics | 2008 | 4 Pages |
Abstract
The digital virtual mask technique based on digital micro-mirror device (DMD) is applied in the field of micro-engineering such as the machining of micro-optical elements. On the premise of universality, the error of digital virtual mask technique is theoretically deduced, combined with the functional diagram used in the experiment. Based on the expanding application of Rayleigh's criterion, the reference of calculating the error of the lithography mask technique is given. And the method of improving the technique is also discussed.
Keywords
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Physical Sciences and Engineering
Engineering
Engineering (General)
Authors
Min Chen, Shenglin Yu, Ningning Luo, Yiqing Gao,