| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 857165 | Procedia Engineering | 2014 | 10 Pages |
Abstract
Authors in the paper describe apparatus ZIP-12PK for activated reaction evaporation by electron beam which belongs to PVD methods. In paper are results of substrate temperature testing in vacuum chamber during coating deposition by reactive evaporation and influence of geometric substrates position in vacuum chamber on coating thickness is studied by authors. Next are presented time functionality of substrate temperature on glow discharge of Ar and influence of current density I on substrate (cathode) bias U. Cleaning of the substrate surface was realized in Ar discharge.
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