| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 862553 | Procedia Engineering | 2011 | 4 Pages |
The development of “protein resistant” materials is challenging since protein hysisorption takes place on most surfaces due to van der Waals interactions, hydrogen bonding and entropy effects. In this work a new process for converting a surface resistant to protein adsorption is presented by using a photo-patternable poly(vinyl alcohol) (PVA) based film. This material minimizes effectively protein physisorption and it can be patterned through photolithography on top of any substrate. Herein the PVA-based film is patterned on top of a poly(styrene) (PS) film, in order to achieve selective protein patterning on the PS film and demonstrate the resistance of the PVA-based material to protein physisorption. The proposed methodology is expected to facilitate the fabrication of sensors and bioelectronic devices since it provides a patterning route with alignment capabilities for protein resistant-surfaces and it is based on an easy to implement process.
