Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
865560 | Tsinghua Science & Technology | 2009 | 7 Pages |
Abstract
As mask features scale to smaller dimensions, the so-called “3-D mask effects” which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results. Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94, and this approach gives improved accuracy and faster results than existing methods.
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Engineering (General)
Authors
Xiong (ç ä¼), Zhang (å¼ è¿å®), Min-Chun Tsai, Wang (ç ç), Yu (ä½å¿å¹³),