Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8852999 | Ecotoxicology and Environmental Safety | 2018 | 9 Pages |
Abstract
Tall fescue (Festuca arundinacea Schreb) was widely studied for phytoremediation of organic or heavy metal contaminated soils. However, there is still little information concerning toxicity of chromium (Cr) to tall fescue and roles of nitric oxide (NO) in plants against Cr(VI) stress. In this study, different Cr(VI) treatments (0, 1, 5 and 10â¯mg/L Cr(VI)) and NO treatments were applied with different combinations in hydroponics culture and their interactions to tall fescue were studied. Specifically, 100â¯ÂµM sodium nitroprusside (SNP) and 100â¯ÂµM NG-nitro-L-arginine-methyl ester (L-NAME) treatments were used to apply exogenous NO or inhibit synthesis of NO respectively. Our results showed that tall fescue exhibits comparable Cr(VI) tolerance as wheat (Triticum aestivum L.). Additionally, Cr(VI) accumulation in tall fescue leaves were carefully studied and discussed. Moreover, we observed the significantly increased reactive oxygen species (ROS) contents of tall fescue when subjected to Cr(VI) stress, as well as decreased photosynthetic activities induced by Cr(VI) stress by methods of chlorophyll a fluorescence transient, slow chlorophyll fluorescence kinetics and rapid light response curves. Decreased behaviors of photosynthetic activities may due to destruction of antennae pigments by Cr(VI), ROS burst induced by Cr(VI), and down regulation of photosystem II (PSII) by non-photochemical quenching to avoid over reduction of quinone A, which could be considered as an important strategy to cope with Cr(VI) stress. Meanwhile, exogenous NO treatment improves overall physiological and photosynthetic behaviors of tall fescue against Cr(VI) stress. Moreover, increased translocation factors and improved Cr(VI) tolerance of plants under exogenous NO treatment suggest that SNP treatment could be a useful application for Cr phytoremediation.
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Authors
Meiyu Huang, Honglian Ai, Xiaoxiang Xu, Ke Chen, Hong Niu, Huihui Zhu, Jie Sun, Dongyun Du, Liang Chen,