Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8948430 | Ceramics International | 2018 | 7 Pages |
Abstract
The TiO2 films were obtained from successive ion layer adsorption and reaction (SILAR) method. A micro-controller based SILAR unit was used to precisely monitor and control the deposition parameters. The films were uniform and free from physical defects such as pores and cracks. A maximum thickness of about 700â¯nm was achieved. The films were found to be polycrystalline without any texture or preferred orientations. The crystallite size of the films was found to increase with thickness while the micro strain and stress were found to reduce with the thickness. Post-deposition annealing was also found to produce the similar results. The films were found to possess an indirect bandgap of about 3â¯eV. Various technically important parameters such as root-mean-square micro strain, Urbach energy, chemical composition, carrier concentration, electrical resistivity etc. were determined. The effects of deposition parameters on the properties of the films is discussed in detail.
Keywords
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Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Ashith V.K., Gowrish K. Rao, Smitha R., Sahana N. Moger,