Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8948534 | Journal of the European Ceramic Society | 2018 | 20 Pages |
Abstract
Polycrystalline Ti2AlN MAX phase films were fabricated by post-deposition annealing of Ti-Al-N film at annealing temperature in the range of 600â°C-800â°C in high vacuum. The temperature-dependent microstructure evolution from Ti-Al-N film to polycrystalline Ti2AlN film has been investigated. It was found that after post-deposition annealing above 600â°C, the as-deposited amorphous Ti-Al-N film transformed to polycrystalline Ti2AlN film. With the increase of annealing temperature from 600â°C to 700â°C, the crystallinity of polycrystalline Ti2AlN film was improved. At 800â°C, the surface Ti2AlN grains completely decomposed and transformed to TiN phase while inner grains was partial decomposed and surrounded by amorphous Al-rich phase. The polycrystalline Ti2AlN film exhibited a highest hardness of 34.1âGPa while the hardness of amorphous Ti-Al-N film was only 24.2âGPa. The mechanism of texture changes and phase transformation as well as its effect on thermal stability was also discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Tao Wang, Zhe Chen, Guoqing Wang, Lei Wang, Guojun Zhang,