Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9566738 | Applied Surface Science | 2005 | 10 Pages |
Abstract
A lot of work has been carried out to prepare chemically homogeneous (1â0â0) silicon surfaces. The hydrogen-terminated (1â0â0) silicon surfaces are the most promising ones, especially in view of their remarkable environmental stability. The simplest way to produce hydrogen-terminated surfaces (attack in water solution of HF of a sacrificial, thermally grown, oxide) results in strongly heterogeneous rough surfaces (although with prevailing dihydride terminations). These surfaces can, however, be flattened and homogenized by treating them in H2 at high temperature (>850 °C). The morphological and chemical changes undergone by the surface during the treatment are studied X-ray photoelectron spectroscopy, atomic force microscopy, scanning tunnelling microscopy, infrared absorption spectroscopy in the attenuated total reflection mode, reflection high energy electron diffraction and thermal programmed desorption, and the mechanisms responsible for them are discussed.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
G.F. Cerofolini, C. Galati, S. Reina, L. Renna, D. Jones, V. Palermo,