Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9566809 | Applied Surface Science | 2005 | 8 Pages |
Abstract
Crystalline structures and roughness characteristics of the films were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements, respectively. Deposition conditions were optimized to obtain films of good quality suitable for the fabrication of surface acoustic wave (SAW) devices. The optimal parameters to obtain a good piezoelectric material have been: rf power 50Â W and reactive plasma.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
I. Sayago, M. Aleixandre, L. Arés, M.J. Fernández, J.P. Santos, J. Gutiérrez, M.C. Horrillo,