| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9567105 | Applied Surface Science | 2005 | 6 Pages |
Abstract
Thin films of zirconium tin titanate, (Zr0.8Sn0.2)TiO4 (ZST) were deposited using a pulsed electron beam source based on a channel-spark discharge for target ablation. An advanced degree of crystallization was obtained for the films deposited on alumina substrate post-annealed at 1000 °C. The crystalline lattice constants of the films are very close to those of the target material, which confirms the same stoichiometry in ZST films and in the bulk.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
M. Nistor, F. Gherendi, M. Magureanu, N.B. Mandache, A. Ioachim, M.G. Banciu, L. Nedelcu, M. Popescu, F. Sava, H.V. Alexandru,