| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9567325 | Applied Surface Science | 2005 | 5 Pages |
Abstract
An improved wavelet transform method for the analysis of specular X-ray reflectivity data has been developed. It permits the evaluation of the thickness and roughness of particular layers in the thin film without assuming a certain film structure. The advantage of this method is that it can be applied to the analysis of a multilayer with unknown chemical and physical properties. It is useful in the characterization of structures with a complex composition, particularly oxide or diffuse layers. The present approach was successfully applied to the study of experimental data obtained on Gd thin nanoparticle films.
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Authors
Oleksiy Starykov, Kenji Sakurai,