Growth and characterization of Zn1−xCdxO films using remote plasma MOCVD

Zn1−xCdxO films were successfully grown by remote plasma enhanced metalorganic chemical vapor deposition (RPE-MOCVD) with diethyl zinc, dimethyl cadmium, and oxygen plasma. The Cd composition x in the Zn1−xCdxO films was tuned by changing a flow rate of group-II sources. With increasing the Cd composition x, the crystal structure was changed from wurzite (WZ) to rock-salt (RS). The optical band-gap of the Zn1−xCdxO films with the wurzite structure up to x ≤ 0.7 varied from 3.3 eV down to 1.9 eV.