Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9567543 | Applied Surface Science | 2005 | 4 Pages |
Abstract
A simple method for silicon microfabrication has been successfully developed. Polypropylene (PP) film as a resist was prepared on a surface of silicon (Si) (1Â 0Â 0) plate by an rf magnetron sputtering method. A pulsed laser light was focused and irradiated to the PP film and a part of the film was removed by laser ablation process in the spot at certain laser intensity. When the sample was immersed in a potassium hydroxide solution, etching occurred only at the part that the PP film was removed by laser ablation. These results raise the possibility of this method as a process for Si microfabrication.
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Authors
T. Oishi, M. Goto, Y. Pihosh, A. Kasahara, M. Tosa,