| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9572135 | Applied Surface Science | 2005 | 4 Pages |
Abstract
The significance of thin films in modern high tech applications requires fast and nondestructive analysis. A method to determine the thickness of single layers with μXRF via a calibration procedure is described. The influences of surface roughness and the angle of the incident beam on the intensity of the fluorescence radiation are discussed.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Carla Vogt, Rainer Dargel,