Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9594489 | Surface Science | 2005 | 9 Pages |
Abstract
In the current work, we prepared TiO2 thin films using vacuum ultraviolet (VUV) irradiation of several different intensities before firing. We then investigated effects of VUV intensity and alkoxide mixtures on the microstructural evolution of the films. The microstructure of the film without VUV treatment comprises uniform anatase grains. Grains in films with VUV irradiation gradually form a domain-like microstructure with increasing VUV intensity. The heterogeneous hydrolysis rate in the mixed alkoxide will trigger formation of the domain-like microstructure.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Ken-ichi Katsumata, Akira Nakajima, Naoya Yoshida, Toshiya Watanabe, Yoshikazu Kameshima, Kiyoshi Okada,