| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9594500 | Surface Science | 2005 | 7 Pages |
Abstract
It is shown by RHEED observation that the thermal desorption is not suitable for this purpose, because the one-dimensional structure of the buried Bi line is disrupted over the same time scale as for removal of the surfactant Bi. Chemical wet etching of the surface layer was found to be a better solution to the removal of the surfactant Bi atoms without destroying the buried Bi lines.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Shuhei Yagi, Wataru Yashiro, Kunihiro Sakamoto, Kazushi Miki,