| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9594681 | Surface Science | 2005 | 7 Pages |
Abstract
An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1Â 1Â 0)-system finding non-dissociative adsorption on clean Cu(1Â 1Â 0) at temperatures below 150Â K. Thermally induced dissociation of D2O is observed to occur above 150Â K, similar to the H2O/Ru(0Â 0Â 1) system, with an experimentally derived activation barrier of 0.53-0.56Â eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53Â eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1Â 1Â 0)-system where partial dissociation was observed already at 90Â K.
Keywords
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
K. Andersson, A. Gómez, C. Glover, D. Nordlund, H. Ãström, T. Schiros, O. Takahashi, H. Ogasawara, L.G.M. Pettersson, A. Nilsson,