Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9594860 | Surface Science | 2005 | 8 Pages |
Abstract
In this work we investigate the influence of self-affine electrode roughness on the admittance of redox reactions during facile charge transfer kinetics. The self-affine roughness is characterized by the rms roughness amplitude w, the correlation length ξ, and the roughness exponent H (0 < H < 1). Our calculations allow analytic expressions to be derived for the admittance as a function of the characteristic self-affine roughness parameters. Furthermore, it is shown that the magnitude of the reaction admittance is strongly influenced by the local roughness exponent H or the fine roughness details at short roughness wavelengths, while the influence of the lateral correlation length ξ or the long wavelength roughness ratio w/ξ is of secondary importance. In addition, the dynamic roughness evolution can strongly influence the reaction admittance and it should taken carefully into consideration.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
George Palasantzas,