Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9595101 | Surface Science | 2005 | 4 Pages |
Abstract
We have investigated ablation of silica glass using pulsed laser plasma soft X-rays. For generating a plasma that emits pulsed soft X-rays, a Ta target was irradiated with focused 532Â nm Nd:YAG laser light with a pulse duration of 7Â ns at a fluence of 104Â J/cm2. The soft X-rays were focused on the surfaces of silica glass using a Au-coated ellipsoidal mirror. The energy density of the soft X-rays can be roughly estimated to be 0.1Â J/cm2, which is sufficiently enough for heating silica glass beyond the boiling point. We found that silica glass is smoothly ablated at 40Â nm/shot. The processes induced by X-ray irradiation have been discussed based on transient-absorption measurements after X-ray irradiation.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
T. Makimura, Y. Kenmotsu, H. Miyamoto, H. Niino, K. Murakami,