Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9595786 | Surface Science | 2005 | 8 Pages |
Abstract
Reflection-absorption infrared spectroscopy (RAIRS) and temperature-programmed reaction/desorption (TPR/D) have been employed to investigate the thermal decomposition of HSCH2CH2OH on Cu(1Â 0Â 0) and the surface intermediates involved. The surface reactions of HSCH2CH2OH proceed via several stages in sequence, including production of surface intermediates of -SCH2CH2OH, -SCH2CH2O-, and the species possibly containing >CCO or >CCS. Carbon-containing products of CH4, C2H4, and CH3CHO evolve between 300 and 500Â K and C2H4 is the major product. Desorption of sulfur-containing products is not observed. HSCH2CH2OH dissociates on Cu(1Â 0Â 0) and oxygen-precovered Cu(1Â 0Â 0) to form -SCH2CH2OH at dosing temperature of 115Â K. However -SCH2CH2O- and the species containing >CCO or >CCS are generated at lower temperatures on oxygen-precovered Cu(1Â 0Â 0). C2H4 is also the major desorption product from HSCH2CH2OH on oxygen-precovered Cu(1Â 0Â 0).
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Jain-Jung Shih, Yung-Hsuan Liao, Kuan-Hung Kuo, Jong-Liang Lin,