| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9699124 | Materials Science in Semiconductor Processing | 2005 | 4 Pages |
Abstract
In this work, we studied the effect of the deposition temperature, partial pressure and crystallite texture on the poly/epi growth rate ratio by decomposition of silane. Deposition was performed by rapid thermal chemical vapor deposition (RTCVD) in the temperature range 590
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Authors
Alexandre Talbot, Julien Arcamone, Cyril Fellous, Florence Deleglise, Didier Dutartre,