High-performance SiGe heterostructure FET grown on silicon-on-insulator

A novel SiGe/Si δ-doped-channel field effect transistors (DDCFETs) grown on silicon-on-insulator (SOI) have been successfully fabricated and demonstrated for the first time. No serious boron outdiffusion is found according to the SIMS analysis. The proposed device with a 1×100 μm2 gate reveals the gate voltage swing (GVS) as wide as 2.6 V. In addition, the reverse breakdown voltage between the Schottky gate and the δ-layer reaches 34 V, which is much larger than that of the same device structure grown on bulk Si. The high GVS and breakdown voltage are attributed to good carrier confinement not only by the V-shaped potential well formed by the heavily δ-doping but also SOI-induced effect.