Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9776270 | Synthetic Metals | 2005 | 4 Pages |
Abstract
We report the preparation and solid state characterization of a silicon (IV) salt based on a new redox active tripodal hexadentate ligand [H3LÂ =Â l,l,l-Tris(lâ²-oxophenalenyl-9â²-N-methyl) ethane]. X-ray analysis of the complex reveals a short Si-N bond distance (av 1.878(16)). The compound is shown to undergo three reversible one-electron reduction steps (without decomposition) due to the formation of radical, anion and dianion of the phenalenyl moiety.
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Authors
S. Samanta, M.E. Itkis, R.W. Reed, R.T. Oakley, F.S. Tham, R.C. Haddon,