| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 978271 | Physica A: Statistical Mechanics and its Applications | 2007 | 7 Pages |
Abstract
We propose a computational method that takes into account the dynamical influence of moving rigid walls over the pattern formation for thin films of diblock copolymers. The competition between the surface field energy and elastic stretching energy, and the effects of the molecular relaxation on pattern formation are studied. Finally, it is also observed that stretching the film enhances the ordering of patterns in it.
Related Topics
Physical Sciences and Engineering
Mathematics
Mathematical Physics
Authors
A. Jr., F.M. Morais, W.A.M. Morgado, S. Martins,