Article ID Journal Published Year Pages File Type
9783952 Materials Science and Engineering: B 2005 4 Pages PDF
Abstract
The effect of temperature on capacitance-voltage (C-V) characteristics of Si/SiO2 interfaces in SIMOX was investigated. The results obtained for SIMOX were compared with the C-V characteristics of Si/SiO2 and Si/SiNx devices. The results suggested that the positively charge centers in buried SiO2 layer were located closer to the superficial Si layer of SIMOX. These positively charged centers considerably affected the capacitance of SIMOX-based devices upon increase of device temperature. It was also found that the MOS type devices fabricated using SIMOX had a higher temperature effect than MIS structures.
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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