Article ID Journal Published Year Pages File Type
9785795 Optics Communications 2005 9 Pages PDF
Abstract
X-ray Fraunhofer diffraction data have been collected from a series of weakly thickness-modulated samples using a synchrotron source. Three different areas of a linear Fresnel zone structure etched in a silicon wafer each 10 μm wide were studied. Each area studied included different numbers of zones, ranging from 6 to 20. An X-ray phase retrieval technique was used to profile the complex refractive index within the areas examined. The zone structure thickness profiles were mapped with a spatial resolution of 100 nm.
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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