Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9785795 | Optics Communications | 2005 | 9 Pages |
Abstract
X-ray Fraunhofer diffraction data have been collected from a series of weakly thickness-modulated samples using a synchrotron source. Three different areas of a linear Fresnel zone structure etched in a silicon wafer each 10 μm wide were studied. Each area studied included different numbers of zones, ranging from 6 to 20. An X-ray phase retrieval technique was used to profile the complex refractive index within the areas examined. The zone structure thickness profiles were mapped with a spatial resolution of 100 nm.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
A.V. Darahanau, A.Y. Nikulin, A. Souvorov, Y. Nishino, B.C. Muddle, T. Ishikawa,